Interdisziplinäres Zentrum für Materialwissenschaften
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Martin-Luther-Universität
Interdisziplinäres Zentrum für Materialwissenschaften
Nanotechnikum Weinberg
Heinrich-Damerow-Str. 4,
D-06120 Halle, Germany
Tel.: +49 345 55 28471
Telefax:+49 345 55 27390 email: info@cmat.uni-halle.de
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abstractMaik Butterling, Wolfgang Anwand, Gerhard Brauer, Thomas E. Cowan, Andreas Hartmann, Marco Jungmann, Krasimir Kosev, Reinhard Krause-Rehberg, Arnold Krille, Ronald Schwengner, Andreas Wagner
Positron annihilation spectroscopy using high-energy photons
phys. stat. sol. (a) (2009),
 
abstractReinhard Krause-Rehberg, Wolfgang Anwand, Gerhard Brauer, Maik Butterling, Tom Cowan, Andreas Hartmann, Marco Jungmann, Arnold Krille, Ronald Schwengner, Andreas Wagner
Progress of the EPOS project: Gamma-induced Positron Spectroscopy (GiPS)
phys. stat. sol. (c) 6 (11) (2009), 2451-2455
 
abstractKatrin Bertram, Matthias Stordeur, Frank Heyroth, Hartmut S. Leipner
Dynamic in situ observations of electrical and structural changes in thin thermoelectric (Bi0.15Sb0.85)2Te3 films
J. Appl. Phys. 106 (6) (2009), 063711
 
abstractV. A. Sivakov, R. Scholz, F. Syrowatka, F. Falk, U Gösele, S. H. Christiansen
Silicon nanowire oxidation: the influence of sidewall structure and gold distribution
Nanotechn. 20 (40) (2009), 405607
 
abstractAdriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, Mato Knez
Atomic layer deposition of Al2O3 and TiO2 multilayers for applications as bandpass filters and antireflection coatings.
Appl. Optics 48 (9) (2009), 1727-1732
 
abstractNadine Geyer, Zhipeng Huang, Bodo Fuhrmann, Silko Grimm, Manfred Reiche, Trung-Kien Nguyen-Duc, Johannes de Boor, Hartmut S. Leipner, Peter Werner, Ulrich Gösele
Sub-20 nm Si/Ge superlattice nanowires by metal-assisted etching
Nano Lett. 9 (9) (2009), 3106-3110
 
abstractG. Radhakrishnan, A. Freundlich, B. Fuhrmann
Chemical beam epitaxy of highly ordered network of tilted InP nanowires on silicon.
J. Cryst. Growth 311, 7 (2009), 1855-1858
 
abstractJohannes de Boor, Nadine Geyer, Ulrich Gösele, Volker Schmidt
Three-beam interference lithography: upgrading a Lloyd?s interferometer for single-exposure hexagonal patterning.
Opt. Lett. 34, 12 (2009), 1783-1785
 
abstractMartin Schade, Nadine Geyer, Bodo Fuhrmann, Frank Heyroth, Peter Werner, Hartmut S. Leipner
High-resolution analytical electron microscopy of silicon nanostructures
phys. stat. sol. (c) 6 (3) (2009), 690-695
 
abstractMartin Schade, Nadine Geyer, Bodo Fuhrmann, Frank Heyroth, Hartmut S. Leipner
High-resolution analytical electron microscopy of catalytically etched silicon nanowires
Appl. Phys. A 95 (2009), 325-327
 
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